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Rapid thermal annealing,chemical vapor deposition and integrated processing

Type doc. :

Livre

Langue :

Anglais

Auteur(s) :

Hodul, David
Gelpey, Jeffrey C.
Green, Martin L.
Seidel, Thomas E.

Editeur(s) :

Materials Research society

Année d'édition :

1989

Sujet(s):
rapid thermal annealing
chemical vapor deposition

Thème :

Electronique

ISBN :

1558990194
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Afficher le Résumé

This volume contains the proceedings of the MRS symposium on rapid thermal annealing (RTA), chemical vapor deposition (CVD), and integrated processing, held in San Diego in 1989. the book documents advances in semiconductor manufacturing technologies that emerged as the microelectronics industry moved toward submicron VLSI and ULSI devices. the central theme is the use of rapid thermal processing (RTP) as an alternative to conventional furnace processing. RTP offers: • short thermal cycles • reduced dopant diffusion • lower thermal budgets • improved junction control • integration of multiple fabrication steps on single-wafer systems • enhanced flexibility for advanced semiconductor manufacturing

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N° Bulletin Date / Année de parution Titre N° Spécial Sommaire
N° d'Exemplaire / inventaire Cote Localisation Type de Support Type de Prêt Statut Date de Restitution Prévue Réservation
111597A92 621.381 RAP 3 C1 BIB-Centrale / Ouvrages Papier interne disponible
Hodul, D. et al. (1989). Rapid thermal annealing,chemical vapor deposition and integrated processing . Materials Research society;