Principles of plasma discharges and materials processing
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Principles of Plasma Discharges and Materials Processing provides a comprehensive treatment of the physical and chemical principles governing plasma discharges and their applications in materials processing. The book begins with the fundamental equations of plasma physics, including Maxwell’s equations, conservation laws, particle dynamics, diffusion and equilibrium properties. It then develops the theory of atomic and molecular collisions, plasma chemistry and plasma-surface interactions. A major part of the book deals with DC and RF plasma discharges, plasma sheaths, high-density plasma sources, glow discharges, pulsed-power systems and plasma diagnostics. The theoretical concepts are related to practical industrial processes such as etching, thin-film deposition, surface modification and ionized physical vapor deposition. The second edition also incorporates modern topics such as dusty plasmas and kinetic theory.
| N° Bulletin | Date / Année de parution | Titre N° Spécial | Sommaire |
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| N° d'Exemplaire / inventaire | Cote | Localisation | Type de Support | Type de Prêt | Statut | Date de Restitution Prévue | Réservation |
|---|---|---|---|---|---|---|---|
| 221753A09 | 621.3 LIE 1 C1 | BIB-Centrale / Ouvrages | Papier | interne | disponible |